Ion Implantation Foundry Services
Trust us as your high-tech, full-service partner for all ion implantation needs, underpinned by rigorous quality standards. We provide reliable, scalable solutions across applications, managing routine production and demand surges while meeting stringent quality protocols.
Our state-of-the-art ion implantation foundries, certified to the highest quality standards, handle a wide range of requirements—from high-volume 300 mm wafer production to R&D on smaller wafers and individual substrate samples. Our capabilities include specialized heated and cryogenic implants on compound semiconductor substrates, delivering precision, compliance, and excellence across all project demands.
Key Capabilities
Unmatched Experience
Coherent’s industry-leading ion implantation applications team delivers the fastest, most cost-effective solutions to drive customer success with:
- Silicon and compound semiconductor substrates
- Heated and room-temperature implantation
- Research and development
- Implantation modeling and process matching
- Small wafer sizes including samples
Reliable Partner
Partner with Coherent to:
- Adapt to evolving markets
- Recover quickly from unexpected ion implantation system issues
- Outsource partial or full ion implantation processes
- Enable 48-hour turnaround support
- Benefit from ISO-9001-2015 facilities
Comprehensive Substrate Materials
- SiC
- SOI
- GaN
- InSb
- ZnSe
- Silicon
- Diamond
- GaAs/InP
- LiNbO3/LiTaO3
